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國立台灣大學
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謝國煌 教授

研究室:高分子所405室、化工館218 室
聯絡電話:(02)3366-3044
傳真:(02)2362-7688
電子郵件:khhsieh@ntu.edu.tw
實驗室:高分子材料研究室 化工館206室
聯絡電話:(02)3366-3043


■學歷

國立台灣大學  化工學士,1972
國立台灣大學  化工碩士,1976
美國底特律大學 化工博士,1981



■主要研究領

聚胺酯(PU)生醫材料、導電高分子、半導體製程材料(光阻劑)、光電高分子、奈米複合材料



■研究著作選列

  1. J. L. Han, Y. C. Chern, K. H. Hsieh, W. Y. Chiu and C. C. M. Ma, 1998, "Kinetics of Curing Reaction of Urethane Function on Base-Catalyzed Epoxy Reaction", J. Appl. Polym. Sci., 68, p.121-127. (NSC-80-0405-E-002-004) (SCI,EI).
  2. J.L. Han, Y.C. Chern, K.Y. Li and K.H. Hsieh, 1998, "Interpenetrating Polymer Networks of Bismaleimide and Polyurethane-crosslinked Epoxy", J. Appl. Polym. Sci., 70, p.529-536. (NSC-83-0405-E002-018 and NSC-84-2216-E002-004) (SCI,EI).
  3. T.T. Hsieh, K.H. Hsieh, G.P. Simon, C. Tiu and H.P. Hsu, 1998, "Effect of Crosslinking Density on the Physical Properties of Interpenetrating Polymer Networks of Polyurethane and 2-Hydroxyethyl Methacrylate-terminated Polyurethane", J. Polym. Res., 5, 3, p.153-162. (NSC-80-0412-B002-180) (SCI+,EI).
  4. T.T. Hsieh, C. Tiu, K.H. Hsieh and G.P. Simon, 1998, "Rheological, Thermal and Free Volume Studies of Blends Containing Two Thermotropic Liquid Crystalline Polymers", Korea Polymer Journal, 6, 1, p.44-52(SCI+).
  5. T.T. Hsieh, K.H. Hsieh, G.P. Simon and C. Jiu, 1999, "Polymer Networks of 2-hydroxyethyl Methacrylate-terminated Polyurethane and Polyurethane", Polymer, 40, p.3153-3163. (NSC-80-0412-B-002-180) (SCI,EI)
  6. Y.C. Chen, S.M. Tseng and K.H. Hsieh, 1999, "Damping Properties of Interpenetrating Polymer Networks of Polyurethane-Modified Epoxy and Polyurethane", J. Appl. Polym. Sci., 74, p.328-335. (SCI,EI)
  7. S.C. Fu, K.H. Hsieh and L.A. Wang, 1999, "Effect of a Deprotection Group on Acrylic Photoresist", J. Polym. Res., 6, 2, p.99-105. (NSC-87-2215-E-002-015) (SCI+,EI)
  8. K.S. Ho, K.H. Hsieh, S.K. Huang and T.H. Hsieh, 1999, "Polyurethane Based Conducting Polymer Blends. I. Effect of Chain Extender", Synth. Met., 107, p65-73 (NSC-85-2216-E-002-004) (SCI,EI)
  9. T.T. Hsieh, C. Tiu, K.H. Hsieh and G.P. Simon, 1999, "Blends of Poly(p-oxybenzoate-co-p-phenylene isophthalate) and Polycarbonate: Miscibility and Free Volume Behaviors", J. Polym. Res., 6, 4, p.211-218. (SCI+,EI).
  10. T.T. Hsieh, C. Tiu, K.H. Hsieh and G.P. Simon, 1999, "Blends containing two thermotropic liquid crystalline polymers: Effect of transesterification on miscibility and rheology", Korea-Australia Rheology J., 11, 3, p.255-263.
  11. S.C. Fu, K.H. Hsieh, and L. A. Wang, 2000, "The Kinetics of a Negative-Tone Acrylic Photoresist for 193 nm Lithography", J. Polym. Sci. Polym. Chem., 38, p.954-961. (NSC-88-CPC-E-002-007) (SCI, EI)
  12. T.T. Hsieh, Carlos Tiu, K.H. Hsieh, George P. Simon, 2000, "Characterization of Thermotropic Liquid Crystalline Polyester/Polycarbonate Blends: Miscibility, Rheology, and Free Volume Behavior", J. Appl. Polym. Sci., 77, 10, p.2319-2330. (SCI, EI)
  13. K.H. Hsieh, J.L. Han, C.Y. Yu, S.C. Fu, 2000, "Graft Interpenetrating Polymer Networks of Urethane-modified Bismaleimide and Epoxy (I): Mechanical Behavior and Morphology", Polymer, 42, 6, p. 2491-2500. (NSC-84-0405-E-002-002) (SCI, EI)
  14. K.H. Hsieh, K.S. Ho, Y.Z. Wang, S.D. Ko, S.C. Fu, 2001, "Miscibility of Poly(thiophene-3-acetic acid) and Poly(ethylene oxide)", Synth. Met.,123, p.217-224.(NSC-85-2216-E002-004 and NSC-88-2216-E224-002) (SCI, EI)
  15. N.K. Chou, S.S. Wang, Y.H. Lin, J.J. Shyu, K.H. Hsieh, G.J. Jan and S.H. Chu, 2001, "Development of a Totally Implantable Pulsatile Centrifugal Pump as a Ventricular Assist Device", Artificial Organs, 25, 8, p.603-606.
  16. S.C. Fu, K.H. Hsieh and L.A. Wang, 2001, "The Negative-Tone Cycloolefin Photoresist for 193nm Lithography", Proc. SPIE Vol. 4345 p.751-760, (NSC-88-CPC-E-002-007) (EI)
  17. S.C. Fu, H.W. Lin, W.Y. Chou, L.A. Wang, and K.H. Hsieh, 2002, "Study on Synthesis and Characterization of Methacrylate Photoresists", J. Appl. Polym. Sci., 83, p.1860-1869.(NSC-88-CPC-E-002-007) (SCI, EI)
  18. J.D. Ko, S.C. Fu amd K.H. Hsieh,2002, "Study on Synthesis and Lithogrphic Performance of 193nm Photoresist", Bulletin of Collage of Engineering N.T.U., No.84, p.67-83.
  19. L.C. Chen, C.Y. Chien, C.P. Chu, D.J. Lee, K.H. Hsieh, C.H. Lee and J.C. Liu,2002."Conditioning and Dewatering of Pulp and Paper Sludge", Drying Technology, 20(4&5), p.967-988, (SCI,EI).



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